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Clarkson University Graduate Student Naresh Penta Wins Best Poster Award
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Clarkson University engineering graduate student Naresh K. Penta won the Best Poster Award at the International Conference on Planarization/CMP Technology in Phoenix, last month.
His poster, "Effect of polishing pads on tunable removal rates of polysilicon over silicon dioxide and silicon nitride films," was co-authored by P. R. Dandu Veera (now of Intel Corporation) and Clarkson Professor S. V. Babu, Penta’s research advisor.
The annual conference provides an international forum for academic researchers, industrial practitioners and engineers from around the world to exchange information on state-of-the-art research in chemical-mechanical planarization (CMP) technology.
It is the biggest conference in the field of CMP with more than 250 participants. Corporations like Intel, IBM, IMEC, Dow, and Samsung discussed issues and future challenges in CMP.
Students from MIT, the University of California, Berkeley, the University of Arizona, Korea’s Hanyang University, and Japan’s Kyushu University competed for the poster prize.
Clarkson University launches leaders into the global economy. One in six alumni already leads as a CEO, VP or equivalent senior executive of a company. Located just outside the Adirondack Park in Potsdam, N.Y., Clarkson is a nationally recognized research university for undergraduates with select graduate programs in signature areas of academic excellence directed toward the world’s pressing issues. Through 50 rigorous programs of study in engineering, business, arts, sciences and health sciences, the entire learning-living community spans boundaries across disciplines, nations and cultures to build powers of observation, challenge the status quo, and connect discovery and engineering innovation with enterprise.