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Clarkson Professor’s Presentation Is Winner At American Chemical Society Annual Conference
[A photograph for newspaper use is available at http://www.clarkson.edu/news/photos/babu.jpg]
S.V. Babu, Clarkson University’s Distinguished University Professor and director of Clarkson’s Center for Advanced Materials Processing (CAMP), is one of three presenters chosen to receive monetary awards for research papers delivered during the symposium on “Application of Polymers in Manufacturing of Integrated Circuits” at the American Chemical Society’s 229th National Meeting and Exposition in San Diego March 13 –16.
The paper, coauthored by graduate students Udaya B. Patri, Youngki Hong, and Vinay G. Meled and delivered by Babu was titled “Chemical Mechanical Polishing of Polymeric Low-k Dielectric Films: A Brief Review.” The major characteristics are removal rates, delamination, surface damage, dielectric constant, and hydrophobocity. The paper reviewed the effect of slurry constituents like slurry chemicals, abrasives and pH on the chemical mechanical polishing (CMP) characteristics of several polymeric low-k films. Low-k dielectric films increase the speed and power-efficiency of next generation high-speed wireless, networking and server products.
Babu’s presentation was one of several oral presentations related to the “Application of Polymers in Manufacturing of Integrated Circuits.” The winners were selected based on the quality of the presentation and importance of the subject. “Although the monetary award is small, the recognition by our peers in the American Chemical Society for the research we are doing at Clarkson in CMP and unconventional abrasives, in particular, is very gratifying,” remarked Babu.
As vice provost for research at Clarkson University, Babu helped attract external funding for research in excess of $16 million last year. According to annual reports submitted to the New York State Office of Science, Technology & Academic Research (NYSTAR), CAMP’s impact on New York businesses over the past four years is nearly $100 million. The NYSTAR report listed 24 New York companies that have benefited from their collaboration with CAMP by realizing cost savings, increased revenues, or made capital improvements as a direct result of technology transfers by CAMP. The Center is also credited with creating 57 new jobs.
Babu did graduate study in chemical engineering at Johns Hopkins University and received a doctoral degree in physics at SUNY Stony Brook. He was at the Niels Bohr Institute in Copenhagen and then at IIT, Kanpur, before joining Clarkson in 1981. He was named director of CAMP in 2000. Babu holds 20 patents related to CMP and thin film deposition. He has authored or co-authored more than 185 scientific publications and edited three books. He consults with several companies in the area of thin films and CMP.
Clarkson University, located in Potsdam, New York, is an independent university with a reputation for developing innovative leaders in engineering, business and the arts and sciences. Its academically rigorous, collaborative culture involves 2,700 undergraduates and 400 graduate students in hands-on team projects, multidisciplinary research, and real-world challenges. Many faculty members achieve international recognition for their scholarship and research, and teaching is a priority at every level. For more information, visit http://www.clarkson.edu.
PHOTO CAPTION: Clarkson University Professor S. V. Babu delivered an award winning research paper on chemical mechanical polishing of polymeric Low-k dielectric films at the American Chemical Society’s 229th National Meeting and Exposition in San Diego March 13 –16.