News & Events
Clarkson University Honors S.v. Babu With Title Of "Distinguished University Professor"
[A photograph for newspaper use is available at http://www.clarkson.edu/news/photos/babu.jpg]
S.V. Babu, director of Clarkson University’s Center for Advanced Materials Processing (CAMP) and former vice provost of research, has been honored with the title “Distinguished University Professor” by the Clarkson University Board of Trustees.
In bestowing the title of Distinguished University Professor on Babu, the trustees recognized his high level of scholarly achievement and innumerable academic and professional contributions to the University.
“During the time Professor Babu has served as CAMP director and vice provost for research, Clarkson's research initiatives has experienced a rise in research dollars to a record in excess of $16 million, and corporate membership in CAMP has grown to an all-time high,” said Clarkson President Tony Collins. “His strong leadership has increased the national and international reputation of CAMP and has fostered interdisciplinary collaboration among scientists and engineers that has put our University at the forefront of high-tech materials processing.”
Babu is a major contributor internationally in the field of chemical-mechanical planarization (CMP), an area of critical importance to semiconductor device manufacturing, and has led the research efforts in CMP at Clarkson for over 10 years now.
He has delivered plenary and key note lectures at numerous international and national conferences and has organized the internationally recognized annual symposia on CMP in Lake Placid for the last nine years, as well as many CAMP conferences and symposia.
Babu has published over 180 papers in journals and conference proceedings, edited three books on CMP, and has co-authored over 20 patents. Three of the patents have been commercialized by Ferro Electronics, for which Clarkson has started receiving royalties this year. Working with him, 25 doctoral and 29 master of science students have completed their degrees. Many undergraduate students have also worked in his research group.
Some of Professor Babu's research interests include CMP of Cu, Ta & SiO2, CMP for shallow-trench isolation, adhesion enhancement, etching of thin films with rf plasma and laser, thin film deposition, laser annealing and particle-surface interactions. His own research, which has totaled more than $5 million in funding, has been supported over the years by NYACOL Nano Technologies, Intel/SRC, JM Huber, Infotonics Technology Center, the National Science Foundation, the U.S. Department of Defense, Climax Engineered Materials, Ferro Electronics, NYSERDA, IBM, Ebara, St. Gobain, PPG Industries, Rohm & Hass, and Kodak among others. He is also a consultant with several companies in the area of CMP and thin films.
Professor Babu joined Clarkson in 1981 as an associate professor of chemical engineering. In 1999 he was appointed interim director of CAMP and one year later named CAMP director.
He completed his doctorate at SUNY Stony Brook in physics after graduate study in chemical engineering at Johns Hopkins University. He was at the Niels Bohr Institute in Copenhagen and for eight years on the faculty at IIT, Kanpur, before coming to Clarkson. He has also worked with IBM at Endicott, Bellcore and Sandia National Laboratories while on leave from Clarkson.
The Center for Advanced Materials Processing is dedicated to developing Clarkson's research and educational programs in high-technology materials processing. CAMP's mandate is to develop innovations in advanced materials processing and to transfer this technology to business and industry.CAMP is built on Clarkson's recognized expertise in colloid and surface science and fine particle technology. It receives support from the New York State Office of Science, Technology, and Academic Research for research and operating expenses as one of 14 Centers for Advanced Technology (CAT). In addition, CAMP-related research receives several million dollars in funding each year from the federal government and private industry.