CAMP Deputy Director Edward McNamara ( on the right) receives an Outstanding Service Award from Clarkson University President Anthony Collins (on the left). In the middle is Distinguished University Professor / CAMP Director S.V. Babu.
CAMP Deputy Director Edward P. McNamara Retires
Edward P. McNamara recently announced his retirement from Clarkson University’s Center for Advanced Materials Processing (CAMP). Mr. McNamara had a successful career with Carborundum Company, Norton Company, and Corning Glass Works prior to joining CAMP in 1987. His background included positions as International Technology Transfer Manager, Plant Manager, and Manager of Process Engineering.
Mr. McNamara’s 18 years of service with NY State’s CAT (Centers for Advanced Technology) program and CAMP at Clarkson have provided the program with an industrial perspective which has been very important to Clarkson as CAMP grew into a strong and highly visible industry-university research center.
At CAMP’s recent Annual Technical Meeting in Canandaigua, NY he was honored with a plaque which read:
“Center for Advanced Materials Processing
Acknowledges With Much Gratitude
Edward P. McNamara
For his dedication to establishing and nurturing the Center’s business and research contracts
Presented at the Center’s Annual Meeting in
Canandaigua, May 2005"
Mr. McNamara will continue to build relationships in his retirement. He was recently named a key liaison person between the Diocese of Albany (Episcopal Church) and the Diocese of Down and Dromore, Northern Ireland. He looks forward to further travel and interaction in his new position.
Seagate Donates Equipment to Clarkson University
Seagate (a leading provider of technology and products enabling people to store, access, and manage information) has donated the Surfscan 6420 to Professor S.V. Babu for use in CAMP’s chemical mechanical planarization facility at Clarkson University. The Surfscan 6420 is a versatile surface inspection tool designed to meet the needs of a broad range of applications. The system easily detects submicron particles on rough surfaces such as polysilicon and tungsten. It is also used for detecting defects on non-uniform films, which is a critical requirement for CMP applications.
CALENDAR OF EVENTS
79 th ACS Colloid and Surface Science Symposium
Clarkson University, Potsdam, New York, June 12 - 15, 2005
CAMP’s Tenth International Symposium on Chemical-Mechanical Polishing (CMP)
Hilton Resort, Lake Placid, New York, August 14 - 17, 2005
CAMP Fall Meeting
Clarkson University, Potsdam, New York, October 5 - 7, 2005
(For information about CAMP industrial short courses, please call Professor Richard Partch at 315-268-2351 or send email to him at email@example.com).
** Information, on these and other CAMP events, is available at the CAMP website at http://www.clarkson.edu/camp.