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CAMP Annual Report:Page 5

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Carbon Dioxide Sequestration in Geological Reservoirs-Assessment of Leakage due to the Presence of Abandoned Wells

Professor Ahmadi, in collaboration with the scientists from the US Department of Energy, is working to assess the safety of carbon dioxide sequestration in geological formation.  In particular, the potential for leakage due to the presence of abandoned wells is being studied.  As part of this project, computer models for gas-liquid flows in porous media as well as in rock fractures are being developed.  The goal is to implement these results in a computational code for modeling large scale geological reservoirs.

COLLOIDAL DISPERSIONS AND PROCESSING 

Novel Polymers for Photovoltaic Biomedical Applications

Professor Devon Shipp and his team have two focus areas of research: new nanomaterials for photovoltaic (PV) devices and novel degradable elastomers.  The PV research, which leverages their expertise in polymer synthesis and nanocomposites, aims to create low-cost, large-area PV devices through the use of phase separation in block copolymers leading to well-ordered polymer nanocomposites.  Such hybrid nanomaterials have great potential for applications in photo- and electrochemical devices (e.g. solar cells, sensors).  The work in Professor Shipp’s laboratory is funded by NYSERDA and the US Army Research Office.  In the second area of research, on degradable elastomeric polymers, Shipp and his students have demonstrated that linear and crosslinked polyanhydrides can be made using photoinitiated thiol-ene chemistry.  This is a simple and effective method of making crosslinked structures that have surface degradation characteristics.  A paper describing this work recently appeared in Chemical Communications.  This technology may be expected to gain usage in many biomedical applications such as drug delivery, orthopedics, tissue engineering and scaffolds.  More information about Professor Shipp’s research activities can be found at www.clarkson.edu/~shippda.

 CHEMICAL-MECHANICAL PLANARIZATION

Metal/Barrier and Dielectric Film Polishing and Planarization

Professor S.V. Babu’s research group is continuing its fundamental investigations of various aspects of chemical-mechanical planarization (CMP) of metal and dielectric films. The current focus on developing slurry formulations is two-fold: one, to identify more chemically active dispersions for low pressure planarization of Cu, Ge, and Ru, while ensuring appropriate selectivity with respect to the underlying barrier and low-k dielectric films and the second, for planarizing dielectric (oxide, nitride and poly-Si) films with controlled and variable selectivities, mostly for front end as well as for MEMS applications. The work on Ge is being conducted collaboratively with IMEC. The ionic strength of the slurry seems to play a key role. A new slurry has been developed for Ru polishing in alkaline conditions based on KIO4 and increasing its solubility.

The investigation of controlled selectivity in material removal when oxide, nitride and/or poly-Si films are being polished has led to several attractive candidate slurries. Several ceria and silica based compositions that yield a high nitride and low oxide polish rate and simultaneously a controllable poly-Si removal rate have been identified. Aqueous and abrasive-free solutions of PDADMAC as well as several other polymers are also very attractive and the chemistry of the pad plays a very important role.  A poster describing the remarkable differences between IC 1000 and polytex pads while polishing with these polymeric solutions and dispersions was presented by Naresh Penta at the 2010 ICPT Conference for which he received the best poster award. Several new patents and disclosures have been filed. Defect characterization and mitigation studies using a variety of hard core/soft shell type composite abrasives also remain of great interest. Professor Babu and his group have synthesized amine and phosphate functionalized silica particles and showed that they can play a very useful role in providing various removal rate selectivities for the dielectric films.  They have also initiated several new experiments on post-CMP cleaning.

At a more fundamental level, they are investigating the role of Ce3+ vs. Ce4+ and the influence of pH in oxide polishing using Ceria abrasives.  

Contact and Non-Contact Techniques for Adhesion Characterization of Microspherical Particles

The Photo-Acoustic Research (PAR) and Nanomechanics/Nanomaterials (NN) Laboratories (PAR) directed and co-directed by Professor Cetin Cetinkaya have been conducting analytical, computational and experimental studies in the areas of laser-based particle removal and contact/non-contact adhesion measurements. There is a critical need in various industries for accurate adhesion measurements and characterization of micro/nanoparticles on flat and rough substrates. The PAR Lab has developed a novel characterization method to quantify the adhesion properties of single microparticles in a non-contact/non-destructive manner under various conditions. Since the non-contact method does not require the dislodgement of the particle from its substrate, the contributions of external effects, such as humidity, electrical field, and temperature, can be studied on a single particle at the same contact point. The current research effort focuses on (nanoparticles) coated toner particles and pharmaceutical particles. The PAR and NN laboratories have received research funds from the National Science Foundation, Intel, SEMATECH, Xerox Corp., Wyeth Pharmaceuticals, Pfizer Inc., the Consortium for the Advancement of Manufacturing in Pharmaceuticals (CAMP), Praxair/Electronics, the US Army, as well as the Center for Advanced Materials Processing (CAMP) at Clarkson.

 

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Professor William Jemison Appointed Chair of Clarkson University’s Department of Electrical & Computer Engineering

 

Dr. Jemison

Professor William Jemison


Professor William Jemison has been appointed chair of Clarkson University’s Department of Electrical & Computer Engineering (ECE), effective July 1.



 

"Professor Jemison brings a wealth of industrial and academic experiences to lead the ECE Department to the next level of excellence," said Goodarz Ahmadi, dean of the Wallace H. Coulter School of Engineering.

   

Jemison received his Ph.D. in electrical engineering from Drexel University in 1993 and joined Lafayette College in 1996. Prior to joining academia, he had 11 years of government and industry experience at Flam & Russell Inc., Lockheed Martin, and the Naval Air Warfare Center.



Jemison was elected a fellow of IEEE in 2007 for contributions to microwave photonics for radar and communications. He also has received the Carl R. and Ingeborg Beidleman Research Award from Lafayette College in 2002, as well as three IEEE Lehigh Valley Section Outstanding Advisor Awards in 1997, 1998 and 1999 for his work with the IEEE student branch at Lafayette.



Professor Jemison’s research interests cover the areas of microwave photonic systems, microwave/mm-wave antenna design, radar systems, wireless and optical communications systems, lidar systems, and biological applications of microwaves and photonics. He has authored many quality technical publications, holds several U.S. patents and has given invited presentations in the U.S. and around the globe. His research has been funded by the National Science Foundation, the Office of Naval Research, and the Center for Optical Technologies.