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| >Clarkson’s CAMP Sponsors Tenth International Symposium on Chemical Mechanical Planarization | ||
The Tenth International Symposium on Chemical-Mechanical Planarization (CMP), sponsored by CAMP, was held during the month of August. It took place at the Hilton Resort in Lake Placid, NY from August 14 - 17, 2005. Over 100 professionals from Japan, Korea, Germany, Belgium and USA as well as from many large and small semiconductor manufacturing companies and suppliers like IBM, Intel, AMD, Texas Instruments, Samsung, St. Gobain, Rohm & Haas, Ferro, Micron, Fujimi, Hitachi Chemical, Degussa, Ebara, ATMI, Praxair, and JSR attended the meeting. It was Co-Chaired by Distinguished University Professor/CAMP Director S.V. Babu, Dr. Manabu Tsujimura, Executive Officer and Deputy Group Executive of Ebara Corporation, Japan, Dr. Charles Davis, Organizational Leadership Project Manager and Senior Technical Staff Member, IBM, and CAMP Professor Yuzhuo Li. The Conference included presentations by industrial and university representatives and a poster session displaying CAMP’s research activities on CMP. Topics covered included planarization of Cu, Ta and other barrier materials, integration and CMP of porous low-k materials, Electrochemical CMP or ECMP, pad design, characterization and conditioning, slurries and abrasives, modeling of the CMP process and post CMP cleaning, all relevant to future 60 and 45 nm technologies. In addition, the Symposium featured two excellent after dinner speakers. Dr. Russ Lange (IBM Fellow and V.P. of Technology – retired) spoke about advances in technology and Professor Egon Matijevic' (the Victor K. LaMer Chair in Colloid and Surface Science) gave a talk titled “Fine Particles: the Good, the Bad, the Ugly, but also the Beautiful and the Funny.” |
After dinner speaker Dr. Russ Lange (IBM Fellow and V.P. of Technology - retired)
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Co-Chairs of the Tenth International Symposium on Chemical-Mechanical Planarization. From left: Dr. Manabu Tsujimura, Executive Officer and Deputy Group Executive of Ebara Corporation in Japan, Distinguished University Professor / CAMP Director S. V. Babu, CAMP Professor Yuzhuo Li and Dr. Charles Davis, Organizational Leadership Project Manager and Senior Technical Staff Member of IBM.. |
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Three companies join CAMP as Corporate Members:
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Professor Cheng and some of his graduate students have been developing efficient thermal models and circuits for the SOI devices and interconnects to take into account self-heating effects in SOI chips. These efficient thermal models and circuits greatly improve the accuracy of the existing thermal circuit used in the SOI industry for electro-thermal simulation of integrated circuits. The models/circuits will provide useful tools for modeling, characterization, optimization and reliability prediction of SOI devices and integrated circuits. Professor Cheng is also involved in the investigation of single-event effects in SiC devices induced by ionizing particle radiation for space and aeronautic applications.
Extruders
Professor Greg Campbell, director of CAMP's Extrusion and Mixing Consortium, continues to develop a more descriptive analysis for screw pumps, augers, and extruders. Over the past year much of his group’s effort has been focused on the conveying of particular solids with these devices. In addition, his group is working to understand structure development in concentrated two phase systems. They found that bimodal dispersions act quite differently from single particle size systems. Also they have an actual program focused on understanding the reactions and physical changes that occur in an epoxy which forms liquid crystalline structures.
Particle Size Analysis and the Use of Particulates in Advanced Materials Processing
Professor Don H. Rasmussen has published extensively in the areas of nucleation and growth of new phases and on techniques to study nucleation and particle growth processes. His research is focused on (1) the study of the kinetics of crystal growth from the liquid and from solution using hot stage microscopic techniques; (2) characterizing concentrated colloidal systems using fiber optic dynamic light scattering; (3) metal particle nucleation and growth in non-aqueous media; (4) nano-scale ceramic particle nucleation and growth, and in the deposition of thin ceramic films; (5) homogeneous nucleation in aerosols; and finally, the influence of surface properties of polymers and colloidal particles on the chemical-mechanical polishing of metal and nonmetal films. His ongoing experimental projects include: (1) measurement of the dynamic scattered light power spectrum from concentrated colloidal systems using a bifurcated single mode fiber optic probe (being developed to study particle breakdown, aggregation or growth in concentrated systems; the probe reduces the influence of multiple scattered light), (2) determination of the particle size from the shape of the power spectrum and the particle concentration from the integrated power spectral density, (3) nucleation and growth of particles in supersaturated systems (both aerosols in vapors and particles in supersaturated liquors), and (4) the characterization of the hardness and surface properties of CMP polishing pads by surface energy determination and measurement of hardness using nano-indentation resistance. The establishment of a laboratory for the determination of phase equilibrium in ternary surfactant systems is currently a high priority.