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From left: Vice Provost / CAMP Director S.V. Babu, Keynote Speaker Mr. Scott Donnelly (Senior Vice President of Corporate Research & Development at G.E.), Clarkson University Provost Anthony Collins, and CAMP Deputy Director Edward McNamara.

CAMP Annual Technical Meeting

CAMP's Annual Technical Meeting was held May 14-16, 2001 in Saratoga Springs, New York. The very successful meeting had over 90 attendees including representatives of Industry, University and New York State Economic Development Organizations.

The keynote speakers included Dr. Jack Chang (Vice President and Associate Director of Research and Development at Eastman Kodak Company) and Mr. Scott Donnelly (Senior Vice President of Corporate Research and Development at G.E.). Dr. Chang's Keynote Address was entitled "Materials Science and Imaging: The Past into the Future" and Mr. Donnelly's presentation was entitled " The Digitization of R & D." In addition, Vice Provost / CAMP Director S.V. Babu and CAMP Deputy Director Edward McNamara presented a retirement gift to Dr. Gary Bottger of Eastman Kodak (a CAMP Corporate Sponsor) for his excellent support and contributions to CAMP.

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From left: CAMP Deputy Director Edward McNamara, Clarkson University President Denny Brown, Keynote Speaker Dr. Jack Chang (Vice President & Associate Director of Research and Development at Eastman Kodak Company) and Vice Provost / CAMP Director S.V. Babu.

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This year's posters were judged in three categories: most attractive, most creative, and best overall. Certificates were presented by CAMP's Dr. Dana Barry to the first, second, and third place winners of each category. The judges were Dr. Kevin Albaugh (Praxair), Dr. Mike Chu (Ferro Electronic Materials), Dr. Paul Gilman (Praxair), and Dr. Greg Slack (DuPont Pharmaceuticals). The winners are listed below.

The First Place Most Attractive Poster is on "A Radical Look at Reactive Solution Polishing Mechanisms." The winner is Jason Keleher and the Professor involved is Professor Li.

The Second Place Most Attractive Poster is on "Mechanical Removal Rates in Chemical-Mechanical Polishing of Copper Using an Alumina Slurry." The winner is Lirong Guo and the Professor involved is Professor Subramanian.

The Third Place Most Attractive Poster is on "A Model for Effects of Abrasive Particle Roughness and Colloidal Forces on Chemical-Mechanical Polishing." The winner is Ali Mazaheri and the Professor involved is Professor Ahmadi.

The First Place Most Creative Poster is on "Modification of Silica Nanoparticle Surfaces for Biologically Important Charge Transfer Interactions." The winner is Evon Powell and the Professor involved is Professor Partch.

The Second Place Most Creative Poster is on "Turbulent Liquid Fuel Spray Formation in Rocket Engines." The winner is David Schmidt and the Professor involved is Professor Ahmadi.

The Third Place Most Creative Poster is on "Characterization of the Surface Properties of Polishing Pads." The winners are Professor Don Rasmussen and Saurabh Jain. The Professors involved are Professors Subramanian and Rasmussen.

The First Place Best Overall Poster is on "The Mechanism of Copper Removal in Copper Chemical Mechanical Planarization." The winner is Derek Stoll and the Professor involved is Professor Babu.

The Second Place Best Overall Poster is on "The Effect of pH in Chemical-Mechanical Polishing of Copper and Tantalum." The winner is Anurag Jindal and the Professor involved is Professor Babu.

The Third Place Best Overall Poster is on "Controlling Stability of Slurry Particles with the Oppositely Charged Polyelectrolytes." The winner is Weili Yu and the Professor involved is Professor Borkovec.